JPS-9030 XPS surface-chemistry analysis

JEOL · Warpage, topography and stress metrology

Purpose: Compare surface elements and chemical states before/after cleaning to narrow residue and process hypotheses.
Technical approach: XPS analyzes photoelectron spectra. JPS-9030 emphasizes millimetre-scale wide-area averages; depth profiling depends on the ion-source configuration.
Scope of use: For vacuum-compatible films, powders or plates; assess whether localized residue contributes enough signal within the analysis area.
Limitations and open questions: These evaluation considerations are compiled by BLNKK from public information. They are not supplier guarantees or a mandatory submission checklist.
Scope and limitations
Area averages can mix surfaces and do not guarantee micro-residue localization or unique adhesive identification. Charging, exposure and sputtering conditions can affect interpretation.
What to prepare
BLNKK suggests preparing material identities, before/after and blank references, residue area/location and handling history for matched-condition spectra.
Confirm with the supplier
Confirm analysis area, sample compatibility, charge compensation and settings. For depth work, review ion/GCIB options, potential sample alteration and reference-spectrum interpretation.
Public evidence: The official page shows elemental, chemical-state and depth examples. GCIB/monochromatic sources are options, not demonstrated identification of this adhesive.

Contact the supplier

Find the company’s contact details and ask about this solution through its official channels.