SU5000 diced-sidewall and exposed-surface SEM imaging

Hitachi High-Tech · Engineering measurement and characterization

Purpose: Examine diced-sidewall residue and damage morphology for process and anomaly comparisons.
Technical approach: SU5000 uses a Schottky field-emission electron beam with high-vacuum/variable-pressure operation and selectable imaging signals.
Scope of use: Accessible, mounted sidewalls or prepared cross-sections require suitable material, geometry and charging conditions.
Limitations and open questions: These evaluation considerations are compiled by BLNKK from public information. They are not supplier guarantees or a mandatory submission checklist.
Scope and limitations
SEM does not directly see through opaque packages. Morphology or compositional contrast is not residue chemical identification; charging, coating and beam effects affect interpretation.
What to prepare
BLNKK suggests preparing target locations, access/preparation method, materials/conductivity, prior images and permissible coating or beam conditions.
Confirm with the supplier
Confirm mounting/grounding, vacuum and detectors, low-damage imaging conditions, and whether separate chemical analysis and control samples are needed.
Public evidence: Hitachi documents imaging modes and material/semiconductor examples, including topographic and backscatter contrast.

Contact the supplier

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