QuantumATK atomic-interface transport comparison

Synopsys · Atomistic, molecular and materials simulation

Purpose: Compare how material and interface structure may contribute to high contact resistance, alongside measurements of actual contacts.
Technical approach: QuantumATK models atomic structures and electron transport in interconnect metals, barriers and contact interfaces.
Scope of use: Suitable for research with defined compositions, interface structures and computational boundaries. RDL applications need a corresponding model.
Limitations and open questions: These evaluation considerations are compiled by BLNKK from public information. They are not supplier guarantees or a mandatory submission checklist.
Scope and limitations
Results depend on the modeled interface and method. Defects or contamination outside that model cannot be ruled out; calculations do not replace contact-resistance or process validation.
What to prepare
BLNKK suggests gathering metal/barrier compositions, interface assumptions, process differences and contact-resistance measurements for model-to-experiment comparison.
Confirm with the supplier
Confirm the required modules, interface construction, convergence checks, experimental calibration and deliverable transport analyses.
Public evidence: The semiconductor datasheet describes interconnect/barrier-metal interface resistance calculations; the product page explains the available atomistic methods.

Supporting references

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