Wotan visible-pattern dual-sided AOI review
Unity Semiconductor · Engineering measurement and characterization
- Purpose
- RDL short investigation needs visible patterns correlated with process stages and electrical locations.
- Technical approach
- Full-color optics and simultaneous dual-sided AOI inspect visible surface patterns.
- Scope of use
- Consider visible-pattern or post-lithography review, with feature size, contrast and sampling confirmed.
- Limitations and open questions
These evaluation considerations are compiled by BLNKK from public information. They are not supplier guarantees or a mandatory submission checklist.
Scope and limitationsAn apparent bridge does not prove an electrical short; surface images do not reveal buried lines. The page gives no resolution qualification for the actual RDL.
What to prepareBLNKK suggests preparing line/space, surface details, process images and electrical locations, with comparable normal/abnormal samples.
Confirm with the supplierConfirm optical configuration, visibility, classification and feature recognition, plus image-to-electrical correlation.
- Public evidence
- The official Wotan entry documents these capabilities under UNITY-SC.
Contact the supplier
Find the company’s contact details and ask about this solution through its official channels.
Related engineering problems
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BLNKK organizes information from public sources. A company profile does not imply a documented solution. Applicability still needs confirmation against your samples and engineering conditions.