Wafer 2D AOI
GPM · Measurement and inspection
Research candidate · suitability unconfirmed
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Research checked: 2026-10-15- Purpose
- Potential engineering use: [As-fabricated RDL shorts] Inspect initial shorts associated with lithography, metal lines and etch residues.
- Technical approach
- Detailed mechanism and process conditions are not documented here. Confirm with the supplier.
- Scope of use
- Potential engineering use: [As-fabricated RDL shorts] Inspect initial shorts associated with lithography, metal lines and etch residues.
- Limitations and open questions
- [As-fabricated RDL shorts] AOI may miss buried shorts; correlate electrical results and defect coordinates. Supplier confirmation of samples, specifications and service availability is required; improvement has not been demonstrated.
- Public evidence
- The official source lists Wafer 2D AOI.
Supporting references
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Potential uses by engineering problem
RDL line-to-line shorts after fabrication
Inspect initial shorts associated with lithography, metal lines and etch residues.
AOI may miss buried shorts; correlate electrical results and defect coordinates.
View engineering problem →BLNKK organizes information from public sources. A company profile does not imply a documented solution. Applicability still needs confirmation against your samples and engineering conditions.