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Current problemWafer probing contact and thermal-control validity
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Wafer probing contact and thermal-control validity

Check BLNKK's understanding of the problem, then review priority paths, candidate solutions and missing conditions.

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3 priority paths3 candidate solutions3 sources

BLNKK's current understanding

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Object and structure
Test contacts on wafer pads, bumps, copper pillars and framed CSP/WLP devices
Stage of occurrence
Wafer sort, temperature-controlled probing and post-dicing framed-wafer testing
Observable symptoms
Unstable probe contact, false opens, temperature-dependent readings or probe-mark damage
Engineering decision
Compare contact baselines, probe force and actual temperature before separating test artifacts from device faults

Paths to assess first

Paths serve different purposes and can be combined
01
Probe-contact and mark baselinesCheck pad/bump geometry, probe force and marks to establish a repeatable contact baseline.
First
02
Instrument calibration and actual-temperature controlCalibrate instruments and guarding, then check chuck and actual DUT temperatures and drift.
First
03
Frame, fixture and contact retest controlsCompare actual wafer/frame support, coordinates and retests to separate fixture artifacts from persistent device abnormalities.
First

Current candidate solutions

Sample suitability still needs confirmation
View all 3 candidate solutions
Next: confirm engineering conditionsUse 4 key conditions to adjust the assessment order, then choose solutions to compare.
Check engineering conditions →