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DXR3 Raman spectra for accessible TSV-adjacent silicon

Thermo Fisher Scientific · Engineering measurement and characterization

Purpose
Compare spectra from optically accessible silicon near TSVs to support local strain assessment.
Technical approach
DXR3 confocal Raman spectra provide strain-related peak-shift evidence, with thermal/material effects distinguished.
Scope of use
Evaluate locations yielding usable silicon signals with validated access, references and stress conversion.
Limitations and open questions

These evaluation considerations are compiled by BLNKK from public information. They are not supplier guarantees or a mandatory submission checklist.

Scope and limitations

Silicon examples do not establish DXR3 TSV stress specifications or keep-out acceptance. Arbitrary buried-region coverage is not demonstrated.

What to prepare

BLNKK suggests preparing orientation, covering layers, locations, thermal histories and low-strain references, with laser conditions checked for heating.

Confirm with the supplier

Confirm wavelength/access, peak calibration, spatial sampling, stress-conversion models and validation on representative TSV specimens.

Public evidence
The November 2024 silicon note names DXR3/DXR3xi; its named strain-imaging example uses DXR3xi.

Supporting references

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Related engineering problems

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BLNKK organizes information from public sources. A company profile does not imply a documented solution. Applicability still needs confirmation against your samples and engineering conditions.