Mechanical Tester nanoindentation and scratch testing
NANOVEA · Measurement and inspection
Research candidate · suitability unconfirmed
Official public page; sample suitability remains unconfirmed.
Research checked: 2026-10-15- Purpose
- Potential engineering use: [RDL film/cure-induced curvature increment] Assess film and cure-material contributions to curvature increments.
- Technical approach
- Detailed mechanism and process conditions are not documented here. Confirm with the supplier.
- Scope of use
- Potential engineering use: [RDL film/cure-induced curvature increment] Assess film and cure-material contributions to curvature increments.
- Limitations and open questions
- [RDL film/cure-induced curvature increment] Require pre/post-film curvature, thickness and properties; indentation modulus is not residual-stress measurement. Supplier confirmation of samples, specifications and service availability is required; improvement has not been demonstrated.
- Public evidence
- The official source lists Mechanical Tester nanoindentation and scratch testing.
Supporting references
Contact the supplier
Find the company’s contact details and ask about this solution through its official channels.
Potential uses by engineering problem
Which RDL layer is making the wafer bend more?
Assess film and cure-material contributions to curvature increments.
Require pre/post-film curvature, thickness and properties; indentation modulus is not residual-stress measurement.
View engineering problem →BLNKK organizes information from public sources. A company profile does not imply a documented solution. Applicability still needs confirmation against your samples and engineering conditions.