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AEMC

Explore the supplier’s public information and its documented technical solutions.

Research candidate · suitability unconfirmed

Unclaimed company profile based on public research. Supplier endorsement and project-level performance are unconfirmed.

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Catalog solutions · 3

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Materials and interfaces

Advanced-packaging underfill

Potential engineering use: [Underfill voids and post-cure delamination] Compare dispensing, capillary flow, cure and interface-inspection results. [Underfill fillet and keep-out interference] Compare dispense volume, path and fillet geometry.

Research candidate · suitability unconfirmed

Official public page; sample suitability remains unconfirmed.

Research checked: 2026-10-15

Potential uses by engineering problem

Underfill voids and post-cure delamination in large multi-die packages

Compare dispensing, capillary flow, cure and interface-inspection results.

Identify the first defective process stage; product capability does not prove void-free filling.

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Underfill fillet interference with keep-out areas

Compare dispense volume, path and fillet geometry.

Use actual gaps, wetting and cured dimensions; low viscosity or precise dispensing does not guarantee clearance.

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Materials and interfaces

Positive/negative/lift-off photoresists

Potential engineering use: [As-fabricated RDL shorts] Inspect initial shorts associated with lithography, metal lines and etch residues.

Research candidate · suitability unconfirmed

Official public page; sample suitability remains unconfirmed.

Research checked: 2026-10-15

Potential uses by engineering problem

RDL line-to-line shorts after fabrication

Inspect initial shorts associated with lithography, metal lines and etch residues.

AOI may miss buried shorts; correlate electrical results and defect coordinates.

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Materials and interfaces

Advanced-packaging polyimide dielectric

Potential engineering use: [RDL film/cure-induced curvature increment] Assess film and cure-material contributions to curvature increments.

Research candidate · suitability unconfirmed

Official public page; sample suitability remains unconfirmed.

Research checked: 2026-10-15

Potential uses by engineering problem

Which RDL layer is making the wafer bend more?

Assess film and cure-material contributions to curvature increments.

Require pre/post-film curvature, thickness and properties; indentation modulus is not residual-stress measurement.

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