EagleT-AP 2D/3D inspection and metrology for micro-bumps
Identifies height, coplanarity, dimensional, placement and surface-defect deviations in dense bumps, Cu pillars and RDL for advanced-packaging process control.
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View contact information ↓Applications: Micro-bump, Cu pillar, RDL, PI/PR and via openings · RDL photoresist and wafer patterns
Identifies height, coplanarity, dimensional, placement and surface-defect deviations in dense bumps, Cu pillars and RDL for advanced-packaging process control.
RDL lithography review needs photoresist thickness, uniformity and profile comparisons before downstream processing.
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Taiwan · Supplier office
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Taiwan · Supplier office
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Taiwan · Supplier office · Technical support
Official source ↗Source checked
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