WaferStorm advanced-packaging wet processing
Flux, resist or via residues can affect downstream processing. Cleaning methods need to be assessed against the residues and exposed packaging materials.
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View contact information ↓Applications: Advanced-packaging residue removal · Cu-pillar / flip-chip-bump resist
Flux, resist or via residues can affect downstream processing. Cleaning methods need to be assessed against the residues and exposed packaging materials.
Bump-process comparisons need resist openings, overlay and sidewalls checked before plating.
These candidates are already documented in the engineering problem workflow. Review their conditions, sources and comparison details.
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The form includes quote, product information and support requests. Taiwan and China are regional contacts; the US phones separately cover advanced packaging lithography and wet processing. Specify AP300, WaferStorm or the equipment you need. Official source ↗
United States · Supplier office · Sales inquiries
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Taiwan · Supplier office · Sales inquiries
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Mainland China · Supplier office · Sales inquiries
Official source ↗Source checked
United States · Supplier office · Sales inquiries
Official source ↗Source checked
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