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Current problemInternal voids in substrate microvia copper fill
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Internal voids in substrate microvia copper fill

Check BLNKK's understanding of the problem, then review priority paths, candidate solutions and missing conditions.

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3 priority paths9 candidate solutions9 sources

BLNKK's current understanding

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Structure / bonding interface
Interior of electroplated copper in organic-substrate microvias
Observation stage
After copper-fill fabrication and before assembly
Phenomenon to localize
Fill voids, dimples, or seams
Engineering decision
Use intravia morphology and batch distributions to plan electroplating / pretreatment windows and representative sampling.
Sample evidence still required
Is the void in the copper-fill body or at a Cu / Cu interface after thermal loading?

Paths to assess first

Paths serve different purposes and can be combined
01
Intravia morphology and representative samplingFirst localize incomplete fill and void distributions in the copper body
First
02
Via formation / pretreatment / metallization comparisonsHold via geometry constant when comparing inputs before copper filling
First
03
Copper-fill electroplating and location-distribution comparisonsHold pretreatment constant when comparing bath / equipment windows
First

Current candidate solutions

Sample suitability still needs confirmation
View all 9 candidate solutions
Next: confirm engineering conditionsUse 4 key conditions to adjust the assessment order, then choose solutions to compare.
Check engineering conditions →