Ultra ECP ap-p panel-level plating
Panel bump and RDL plating must address deposition uniformity, pattern distribution and handling. Ultra ECP ap-p provides panel-level plating for evaluating metal-formation conditions.
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View contact information ↓Applications: FOPLP panels · Silicon-wafer TSV / via surfaces · Post-attach FOWLP / chiplet gaps · TSV / fan-out metal planarization
Panel bump and RDL plating must address deposition uniformity, pattern distribution and handling. Ultra ECP ap-p provides panel-level plating for evaluating metal-formation conditions.
Particles/residue before TSV/via deposition call for comparing cleaning conditions and structural tolerance ahead of interface evaluation.
Evaluate flux residues in narrow post-reflow gaps before selecting a pre-underfill cleaning process.
Compare copper-overburden removal and subsequent planarization after TSV fill or fan-out RDL processing.
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